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Extreme Ultraviolet (EUV) lithography makes 13.5 nm circuits

By Damir Beciri
One Comment19 May 2012

fraunhofer-extreme-ultraviolet-euv-radiation-lithographyMicrochips and integrated circuits in today‚Äôs computers and devices are becoming increasingly smaller and more complex. If you ever followed news about components or read vanity bragging from device manufacturers, you may have noticed they use terms concerting circuit printing technology or lithography. Fraunhofer Institute researchers claim they have found the next generation solution that… »