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Creating Mini Mona Lisa image with 30 microns in width

By Maja Bosanac
7 August 2013

gtech-mini-lisa-curtisA team of researchers at the Georgia Institute of Technology (Georgia Tech) has recreated the Mona Lisa, one of the most famous paintings, on the smallest canvas. They painted the “Mini Lisa” on a substrate surface which measures just 30 microns in width or one-third the width of a human hair. The team was able… »

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Extreme Ultraviolet (EUV) lithography makes 13.5 nm circuits

By Damir Beciri
One Comment19 May 2012

fraunhofer-extreme-ultraviolet-euv-radiation-lithographyMicrochips and integrated circuits in today’s computers and devices are becoming increasingly smaller and more complex. If you ever followed news about components or read vanity bragging from device manufacturers, you may have noticed they use terms concerting circuit printing technology or lithography. Fraunhofer Institute researchers claim they have found the next generation solution that… »